[ MS1100-MP ]Magnetron sputtering Machine
Vacuum chamber Size: 1000 x 1100 x 700 (mm)
Limit vacuum/leakage rate: Less than 5E-5Pa/less than 9.0E-5Pa.m³/s
Vacuum recovery: 3E-4Pa (unheated) within 100 minutes
Base plate rotating mechanism: Center drive, 10-1000rpm adjustable, rotating shaft runout <0.025mm/planetary wheel junction
Effective coating area: Φ304mm
Optical control system/control system: Transmission type single optical film thickness monitoring system
Cathode target: 8 "target * 4
Installation: 3040 x 1225 x 2700(mm), Floor load-bearing capacity > 1500kg/m²
Limit vacuum/leakage rate: Less than 5E-5Pa/less than 9.0E-5Pa.m³/s
Vacuum recovery: 3E-4Pa (unheated) within 100 minutes
Base plate rotating mechanism: Center drive, 10-1000rpm adjustable, rotating shaft runout <0.025mm/planetary wheel junction
Effective coating area: Φ304mm
Optical control system/control system: Transmission type single optical film thickness monitoring system
Cathode target: 8 "target * 4
Installation: 3040 x 1225 x 2700(mm), Floor load-bearing capacity > 1500kg/m²
| Vacuum Chamber Size | 1000 x 1100 x 700 (mm) |
| Limit vacuum/leakage rate | Less than 5E-5Pa/less than 9.0E-5Pa.m³/s |
| Vacuum recovery | 3E-4Pa (unheated) within 100 minutes |
| Base plate rotating mechanism | Center drive, 10-1000rpm adjustable, rotating shaft runout <0.025mm/planetary wheel junction |
| Effective coating area | Φ304mm |
| Optical control system/control system | Transmission type single optical film thickness monitoring system |
| Cathode target | 8" target * 4 |
| Install | 3040 x 1225 x 2700 (mm) , Floor load-bearing capacity > 1500kg/m² |
| Peculiarity | Durable, with excellent film thickness uniformity, fast film forming speed, and long-term continuous operation |
| Application | Apply： 1) Optical chips such as DWDM, CWDM, LDWM for optical communication 2) Various fluorescent filters used in medical optics 3) Mass production of filters for on-board radar 4) D-face recognition filter 5) Optical thin film products in the ultraviolet band |
