Magnetron Machine

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[ MS1100-DP ]Magnetron sputtering Machine

Vacuum chamber Size: 966 x 1100 x 688 (mm)

Limit vacuum/leakage rate: Less than 5E-5Pa/less than 9.0E-5Pa.m³/s

Vacuum recovery: 3E-4Pa (unheated) within 100 minutes

Base plate rotating mechanism: Center drive, 10-1000rpm adjustable, rotating shaft runout <0.025mm/planetary wheel junction

Base plate size: Φ95mm / Φ150mm / Φ228mm / Φ304mm or planet wheel optional

Optical control system/control system: Transmission type single/double optical path optical film thickness distribution monitoring system (self-developed)/self-developed

Cathode target: 8 "target * 4

Installation: 3040 x 1225 x 2700(mm), Floor load-bearing capacity > 1500kg/m²
Vacuum Chamber Size966 x 1100 x 688 (mm)
Limit vacuum/leakage rateLess than 5E-5Pa/less than 9.0E-5Pa.m³/s
Vacuum recovery3E-4Pa (unheated) within 100 minutes
Base plate rotating mechanismCenter drive, 10-1000rpm adjustable, rotating shaft runout <0.025mm/planetary wheel junction
Base plate sizeΦ95mm / Φ150mm / Φ228mm / Φ304mm or planet wheel optional
Optical control system/control system

Transmission type single/double optical path optical film thickness distribution monitoring system (self-developed)/self-developed

Cathode target8" target * 4
Install3040 x 1225 x 2700 (mm) , Floor load-bearing capacity > 1500kg/m²
PeculiarityDurable, cost-effective, with excellent film thickness uniformity, fast film forming speed, and long-term continuous operation
Application

Apply:

1) Production of various optical chips such as DWDM, CWDM, LDWM, etc. for optical communication

2) Production of various fluorescent filters for medical optics

3) Production of Automotive Radar Filters

4) Production of 3D facial recognition filters



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