[ ALD-800 ]ALD Optical Coating Machine
Reaction chamber size: Φ800mm x700mm
Substrate size: Φ50mm/Φ100mm / Φ150mm / Φ200mm / Φ306mm
Source bottle : Liquid*3 + Solid*2+ Gas*1
Upgradable configuration: Liquid*3 + Solid*2+ Gas*3
Heating system: Atmosphere ~ 300℃
Auxiliary ion source(Optional) : RF Plasma Source
Optical film thickness meter (Optional) : spectral ellipsometer or optical film thickness meter
Installation: 1685mm*915mm*1420mm
Substrate size: Φ50mm/Φ100mm / Φ150mm / Φ200mm / Φ306mm
Source bottle : Liquid*3 + Solid*2+ Gas*1
Upgradable configuration: Liquid*3 + Solid*2+ Gas*3
Heating system: Atmosphere ~ 300℃
Auxiliary ion source(Optional) : RF Plasma Source
Optical film thickness meter (Optional) : spectral ellipsometer or optical film thickness meter
Installation: 1685mm*915mm*1420mm
| Reaction chamber size | Φ800mm x700mm |
| Substrate Size | Φ50mm/Φ100mm / Φ150mm / Φ200mm / Φ306mm |
| Source bottle | Liquid*3 + Solid*2+ Gas*1 |
| Upgradable configuration | Liquid*3 + Solid*2+ Gas*3 |
| Heating System | Atmosphere ~ 300℃ |
| Auxiliary Ion Source(Optional) | RF Plasma Source |
| Optical film thickness meter (Optional) | Spectral ellipsometer/Optical film thickness meter |
| Installation | 1685mm*915mm*1420(mm) |
| Peculiarity | Durable, can achieve selective deposition |
| Application | Apply： 1) Production of New Energy Coating Products 2) Coating on various complex surfaces 3) Production of Passivation Thin Films for Laser Chips 4) Production of optical communication coating products 5) Coating in the semiconductor field |
