[ IBS-1300D ]IBS Machine
Vacuum Chamber Size：Φ1300mm * 1000(mm)
Substrate Rotation Mechanism：Patented technology, infinitely adjustable 10-100rpm
Effective coating area：370000(mm2)
Sputtering source：Dual RF ion source
Auxiliary Ion Source：Plasma assisted ion source
Sputtering Target System：Adjustable target position，Equipped with multiple target materials
Optical control system/control system：Transmission type optical film thickness monitoring system
Install：2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m²
Substrate Rotation Mechanism：Patented technology, infinitely adjustable 10-100rpm
Effective coating area：370000(mm2)
Sputtering source：Dual RF ion source
Auxiliary Ion Source：Plasma assisted ion source
Sputtering Target System：Adjustable target position，Equipped with multiple target materials
Optical control system/control system：Transmission type optical film thickness monitoring system
Install：2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m²
| Vacuum Chamber Size | Φ1300mm * 1000(mm) |
| Substrate Rotation Mechanism | Patented technology, infinitely adjustable 10-100rpm |
| Effective coating area | 370000(mm2) |
| Sputtering source | Dual RF ion source |
| Auxiliary Ion Source | Plasma assisted ion source |
| Sputtering Target System | Adjustable target position，Equipped with multiple target materials |
| Optical control system/control system | Transmission type optical film thickness monitoring system |
| Install | 2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m² |
| Peculiarity | Good uniformity, fast speed, long-term continuous work, no need to spend a long time adjusting uniformity before each production. |
| Application | Apply： 1) Industrial laser thin film products 2) Production of UV film products 3) Production of ultra-low loss thin film products 4) Production of other types of optical thin film products |
