Due to its highly controllable deposition parameters (thickness, composition and structure), excellent deposition uniformity and consistency, atomic layer deposition technology has a wide range of application potentials in the fields of micro-nano electronics and nanomaterials.
And with the development of technology, more and more applications will be found in the near future. According to the characteristics of the reaction principle of this technology, various kinds of different materials can be deposited. The deposited materials include metals, oxides, carbon (nitrogen, sulfur, silicon) compounds, various semiconductor materials and superconducting materials, etc.