[ IBS-1040S ]IBS Machine
Vacuum Chamber Size:Φ1040mm * 1000(mm)
Substrate Rotation Mechanism:The patented design ensures high precision and stability, facilitating automatic loading
Substrate plate size:70000 ~ 140000(mm2)
Sputtering source:RF ion source
Auxiliary Ion Source:RF grid ion source / RF Plasma Source / RF Plasma Source
Sputtering Target System:Adjustable target position,Provide 3~4 pieces target
Optical control system/control system:Transmission type optical film thickness monitoring system
Install:2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m²
Substrate Rotation Mechanism:The patented design ensures high precision and stability, facilitating automatic loading
Substrate plate size:70000 ~ 140000(mm2)
Sputtering source:RF ion source
Auxiliary Ion Source:RF grid ion source / RF Plasma Source / RF Plasma Source
Sputtering Target System:Adjustable target position,Provide 3~4 pieces target
Optical control system/control system:Transmission type optical film thickness monitoring system
Install:2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m²
Vacuum Chamber Size | Φ1040mm * 1000(mm) |
Substrate Rotation Mechanism | The patented design ensures high precision and stability, facilitating automatic loading |
Substrate plate size | 70000 ~ 140000(mm2) |
Sputtering source | RF ion source |
Auxiliary Ion Source | RF grid ion source / RF Plasma Source / RF Plasma Source |
Sputtering Target System | Adjustable target position,Provide 3~4 pieces target |
Optical control system/control system | Transmission type optical film thickness monitoring system |
Install | 2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m² |
Peculiarity | The film has high quality and can be continuously produced for a long time |
Application | Apply: 1) High power laser thin film products 2) Medical optical thin film products 3) Ultra low loss thin film products 4) Ultra low stress thin film products 5) Optical communication thin film products |