IBS Machine

[ IBS-1040S ]IBS Machine

Vacuum Chamber Size:Φ1040mm * 1000(mm)

Substrate Rotation Mechanism:The patented design ensures high precision and stability, facilitating automatic loading

Substrate plate size:70000 ~ 140000(mm2)

Sputtering source:RF ion source

Auxiliary Ion Source:RF grid ion source / RF Plasma Source / RF Plasma Source

Sputtering Target System:Adjustable target position,Provide 3~4 pieces target

Optical control system/control system:Transmission type optical film thickness monitoring system

Install:2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m²
Vacuum Chamber SizeΦ1040mm * 1000(mm)
Substrate Rotation MechanismThe patented design ensures high precision and stability, facilitating automatic loading
Substrate plate size70000 ~ 140000(mm2)
Sputtering sourceRF ion source
Auxiliary Ion SourceRF grid ion source / RF Plasma Source / RF Plasma Source
Sputtering Target System

Adjustable target position,Provide 3~4 pieces target

Optical control system/control systemTransmission type optical film thickness monitoring system
Install2500 x 3000 x 2850 (mm) , Floor load-bearing capacity > 800kg/m²
PeculiarityThe film has high quality and can be continuously produced for a long time
Application

Apply:

1) High power laser thin film products

2) Medical optical thin film products

3) Ultra low loss thin film products

4) Ultra low stress thin film products

5) Optical communication thin film products





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